Explosive bonding of workpieces

ABSTRACT

First workpieces, for example, beam-leaded integrated circuits, and the like, are bonded to second workpieces, for example, metallized ceramic substrates by first depositing a quantity of primary explosive, such as lead azide, onto each beam lead and then detonating the explosive to explosively bond the integrated circuits to the substrate. In another embodiment of the invention, the explosive bonding force is applied through a buffer sheet of plastic or metallic material which protects the surface of the substrate from contamination and which, in addition, dampens the shock of the explosion. In yet another embodiment of the invention, metal conductive paths are explosively bonded directly to a ceramic or glass substrate to form a &#39;&#39;&#39;&#39;printed circuit pattern.&#39;&#39;&#39;&#39; The same techniques are used to manufacture resistors, capacitors, inductors, etc.

United States Patent 1191 Cranston [4 June 12, 1973 [54] EXPLOSIVE BONDING WORKPIECES 3,408,937 11/1968 Lewis et a1 102/70.2 A

3,461,698 8/1969 B tt [75] Inventor: I Ben amin Howell Cranston, Trenton, 3,474,520 10/1969 z l i et ah" v 4 3,475,814 11/1969 Santargini 29/589 [73] Assignee: Western Electric Company, $23 22 29/421 x lncorp'mted New 3:543:388 12/1970 Blank et a1... 22 Filed; 2 1971 3,570,405 3/1971 Heady, Jr....

' 3,497,947 3/1970 Ardezzone 29/589 X [21] Appl. No.: 202,348

' Related US. Application Data I Primary Examiner-J. Spencer Overholser [60,] Division of S61. N0. 68,431, Aug. 31, 1970, which is Assisla'" Exami'le'iRWald Shore a continuation-in-part of Ser. No. 6,829, Jan. 29, y- Kam et 1970.

. R [52] US. Cl. 29/589, 29/470.1, 29/471.1, [57] ABST ACT I I 29/628 First workpieces, for example, beam-leaded integrated 51 1m 3 01 17 00, 011 7 02 011 7 1 circuits, and the like, are bonded to second workpieces, [58] Field of Search....- 29/421 E, 470.1, for p metallized ceramic t ates by first de- 29/471.1, 486, 497.5, 589, 628; 117/201, positing a quantity of primary explosive, such as lead 1 212; 102/702, 28 azide, onto each beam lead and then detonating the explosive to explosively bond the integrated circuits to [56] References Cit d the substrate. In another embodiment of the invention, UNITED STATES PATENTS the explosive bonding force is applied through a buffer sheet of plastic or metallic material which protects the 123 2 Q surface of the substrate from contamination and which, 2978982 M1961 A X in addition, dampens the shock of the explosion. In yet 2:99 :007 19 1 Franklin 102/7O 2 A x 311M116! embodiment Of the invention, metal conduc- 3,269,315 8/1966 'Gauld '1o2/70.2 A tive paths are explosively bonded directly to a ceramic 3,344,510' 10/1967 Komeishi et al. 29/421 X or glass substrate to form a printed circuit pattern. 3,346,946 1967 g ye 29/470-l The same techniques are used to manufacture resistors, 3,351,016 11/1967 Simpson 102/28 X capacitors inductors eta I 3,362,329 l/l968 Epstein 102/70.2 A i 3,380,908 4/1968 Ono et a], 29/470.1 UX

77 Claims, 32 Drawing Figures PAIENIEB mu 2 ms SHEET UEUF 11 PATENTEU JUN 1 2 I975 sum 03 0F; 11

PATENTEU JJH 1 2 I973 saw on Of 11 PATENIEB JUN] 2 1973 sum 07 0F 1 CONTROL CIRCUIT l J5E PATENTEB JUH1 21975 SHEET 08 0F 11 PATENTED JUNI 2 I975 sum 09 0F 11 EXPLOSIVE BONDING OF WORKPIECES CROSS REFERENCE TO RELATED APPLICATION BACKGROUND OF THE INVENTION 1. Field of the Invention Broadly speaking, this invention relates to explosive bonding. More particularly, in a preferred embodiment, this invention relates to a method of explosively bonding a first workpiece to a second workpiece.

2. Description of the Prior Art In the manufacture of electronic circuitry, the use of discrete electrical components, such as resistors, capacitors, and transistors, is rapidly becoming obsolete. These discrete components are largely being supplanted by the integrated circuit, a small chip of silicon which, by a series of selected masking, etching, and processing steps, can be made to perform all of the functions which may be performed by discrete compo,- nents when these discrete components are suitably interconnected by conventional or printed wiring to form an operating circuit.

Integrated circuit devices are very small, the dimensions of a typical device being approximately 0.035 inch X 0.035 inch. While these microscopic dimensions permit a heretofore undreamed of degree of miniaturization, there are other reasons why these devices are made as small as they are, one reason being that the microscopic dimensions significantly improve the operating characteristics of circuits which are fabricated on IC devices. For example, the switching speed of gating circuits and the bandwidth of I.F. amplifiers, are significantly improved by this miniaturization.

Of course, an integrated circuit cannot operate in vacuo, and must be interconnected to other integrated circuits and to the outside world, for example, to power supplies, input/output devices, and the like. Here, however, the microscopic dimensions are a distinct disad vantage.

Because of improved manufacturing techinques and increased yield, the cost of integrated circuits has dropped drastically in the last decade and now, in many instances, the cost of interconnecting an integrated circuit to another integrated circuit or to the outside world exceeds the cost of the device itself, a most undesirable situation.

In one prior art method of interconnecting integrated circuit devices, each device is bonded to the header of a multiterminal, transistor-like base. Fine gold wires are then hand bonded, one at a time, from the terminal portions of the integrated circuit to corresponding terminal pins on the transistor-like base, which pins, of course, extend up through the header for this purpose, in a well-known manner. Interconnection of the device to other devices or to the outside world is then made by plugging the base, with the integrated circuit device attached thereto, into a conventional transistor-like socket which is wired to other similar sockets, or to discrete components, by conventional wiring or by printed circuitry.

Because of the extremely small size of IC devices, and the attendant alignment problems, attempts to automate this uneconomical hand-bonding process have not proved to be successful. Further, apart from the economics, the use of plug-in integrated circuit devices vitiates many of the highly desirable properties possessed by such devices, for example, the compactness which may be realized and the improved circuit performance which they are capable of yielding.

For these reasons, circuit designers generally prefer to connect integrated circuits directly to an insulating substrate,-such as glass or ceramic, upon which a suitable pattern of .metallic, for example, aluminum or gold, conductor paths has been laid down. Unfortunately, most existing techniques for laying down metallic conductor paths on glass or ceramic are expensive and time consuming. Examples of these existing techniques include sputtering or vacuum depositing a thin metallic film on the substrate followed by the application of a photoresist over the metallic film so deposited. Next, the photoresist is exposed, through an appropriate mark, and developed and the metal film selectively etched away to leave the desired metallic pattern on the substrate. Finally, the metallic pattern is built up to the desired thickness by the electrolytic or electroless deposition technique in which additional metal is deposited onto the existing metallic pattern. An alternate technique, known in the art, for depositing conductive metallic paths on a substrate involves screening a granular suspension of metal particles in a suitable vehicle, such as ethyl cellulose, onto the substrate, in the desired pattern, and then firing the substrate to bind and diffuse the metal granules in the surface of the substrate to thereby create the desired pattern of conductive paths on the substrate. Because of the large number of steps involved, it will be self evident that these prior art techniques are expensive and time consuming.

Returning now to the problems of bonding the devices themselves, the above-described hand-bonding technique for integrated circuit devices may, of course, be used to connect an integrated-circuit device to the terminal land areas of a printed conductor pattern.

However, techniques which more readily lend themselves to automation have also been developed.

U.S. Pat. No. 3,425,252, for example, which, issued to M. J. Lepselter on Feb. 4, 1969, describes a semiconductor device including a plurality of beam-lead conductors cantilevered outward from the device. To bond such a beam-leaded device to a substrate, the device is first aligned with respect to the terminal land areas of the substrate and then heat and pressure are applied to each of the beam leads, by means of a suitably shaped bonding tool, to simultaneously and automatically bond the beam leads to the substrate.

Another bonding technique which may be used with beam-lead devices is the compliant bonding technique described in U.S. Pat. application, Ser. No. 651,411 of A. Coucoulas which was filed on July 6, 1967, now U.S. Pat. No. 3,533,155. This application describes a bonding technique wherein heat and pressure are appliedby a bonding tool to the beam leads through a compliant medium, such as a sheet of 2024 aluminum. The heat and pressure which is applied causes the aluminum sheet to flow plastically and to transmit the bonding pressure to the beam leads, thereby bonding the beam leads to the substrate. I

The above-described techniques successfully permit the simultaneous bonding of all the beam leads of a single device, and, of course, are equally well suited for large area bonding, that is to say, the'case where it is desired to simultaneously bond a plurality of beamleaded devices to a single substrate. However, it is somewhat difficult to align a massive, multi-apertured bonding tool (or a plurality of closely spaced, individual bonding tools) with respect to the integrated circuit devices to be bonded. Yet another problem in large area bonding is that, while it is possible to closely control the dimensions of a given IC device and its alignment with respect to a given set of land areas on a substrate, it is very difficult to control the spacing between this set of land areas and another set of land areas at, say, the other end of the substrate. Since there is thus some uncertainty as to the exact location where each integrated circuit device will be found on the substrate, the use of a massive multi-apertured bonding tool (or a plurality of individual bonding tools) becomes difficult because of the variation in device-to-device spacing from one substrate to another.

Another reason why alternative techniques are desir-.

able for use in large area bonding applications is the fact that it is not possible to manufacture large substrates which are'substantially flat over the entire surface area of the substrate. There thus exists a substantial degree of nonparallelism between the substrate (and hence the IC devices to be bonded) and the bonding tool (or tools). This lack of parallelism may result in bonding pressures being applied to some IC devices which are far in excess of the maximum permitted pressure, resulting in damage to, or the complete destruction of, the affected devices. Similarly, the lack of parallelism may cause bonding pressures to be applied to other IC devices which are far below the minimum pressures required for satisfactory bonding, resulting in weak or non-existent bonds between the devices and the substrate.

Broadly speaking then, the problem is to find an improved method of bonding a first workpiece to a second workpiece. In particular, an important aspect of this problem is to find a method of simultaneously bonding the microleads of a plurality of integrated circuit devices to the corresponding land areas of a substrate, after the devices have been aligned with respect to the substrate, without using a bonding tool which mustitself be aligned with respect to the devices and/or the substrate or which must be provided with a complicated compensating mechanism to compensate for lack of parallelism between the substrate and the bonding tool.

A second important aspect of this problem is to find a method of forming metallic conductive paths or regions on an insulating substrate, particularly a large area substrate, without subjecting the substrate to numerous expensive and time-consuming processing steps.

I have discovered that explosive bonding provides a highly satisfactory solution to the above-described problems. The use of high explosives for metal-working purposes dates, of course, from the turn of the century; however, serious research into this subject matter was not begun until the late forties and early fifties. Initially, research was-concentrated on the use of high explosives to shape massive workpieces which could not be conveniently or economically worked by any other technique. More recently, however, research has been concentrated on explosive welding; the aircraft and aerospace industries,'in particular, being extremely active in this area, as explosive welding is highly attractive to these industries because of the exotic nature of the metals and alloys employed therein.

Explosive metal cladding has also proved extremely successful and is used, for example, to produce the blank cupro-nickel/copper stock used by the Government to mint US. currency.

When compared to the dimensions of typical substrates and electronic components, the workpieces which are welded or clad by prior art explosive techniques are truly massive. For example, a typical prior 7 art application might be to explosively clad a layerof 14 guage titanium to the surface of a cylindrical pressure vessel, 15 feet in diameter by 30 feet long, and which is fabricated from 4 inch thick steel. As another example of the massive workpieces handled by the prior art, in the previously discussed explosive cladding of cupro-nickel/copper stock, a 10 foot by 20 foot sheet of cupro-nickel, 9/ lOths of an inch thick, is explosively clad to a correspondingly dimensioned sheet of copper, 3% inches thick, which in turn is explosively clad to a second 9/ lOths inch thick sheet of cupro-' nickel, to form the finished product.

By way of contrast, the miniature workpieces which are explosively bonded according to the methods of my invention are several magnitudes of order smaller. For example, a typical integrated circuit device may measure only 0.035 inch by 0.035 inch and the 16 or more beam leads to be bonded to the substrate are cantilevered outward from the device and may each measure only 0.0005 inch thick by 0.002 inch wide by 0.006 inch long. Further, typical ceramic or glass substrates may measure only 4 inches X 2 inches X 20 mils thick.

In prior art explosive bonding techniques, such as above described, the workpieces to be bonded are placed in proximity to each other and a sheet charge of high explosive, such as RDX (cyclotrimethylene trinitramine) is overlaid on the upper surface of one of the workpieces to be bonded. A commercial detonator is then implanted at one end of the sheet explosive, and ignited from a safe distance by means of an electrical spark. The detonator then explodes, setting off in turn an explosion in the sheet charge of RDX. The force created by this latter explosion accelerates the first workpiece towards the second workpiece to firmly bond them one to the other.

Because of the massive size of the workpieces used in the prior art, unwanted by-products of the explosion are not of particular concern; neither is contamination of the workpieces or damage to the workpiece surfaces. If a clean surface is required, the workpieces can easily be machined, sanded or buffed to the desired finish. Again by way of contrast, the miniature workpieces to be bonded by the methods of my invention, particularly electronic components such as integrated circuits, are extremely sensitive to contamination. Furthenbecause of their extremely small size, buffing, sanding or polishing of these workpieces to smooth the surfaces thereof and remove impurities therefrom is impractical, if not impossible. In addition, substrates such as glass and ceramic are extremely brittle and tend to craze or crack when subjected to sudden concentrated stresses.

The use of a buffer layer which is positioned intermediate thesheet charge of explosive and the upper surface of one of the workpieces is known in the prior art. However, in the prior art this buffer layer is not prov vided for the purpose of (and indeed would be inoperative'for) protecting the surfaces of the workpieces from chemical contamination or reducing stress concentrations in the workpieces. Rather, in the prior art, these buffer layers are provided to modify the characteristics of the secondary explosive material and,'in particular, to reduce the velocity of detonation.

In the case of massive workpieces of the type bonded by prior art explosive bonding techniques, as much as several hundred pounds of explosive may be required. Obviously, the explosion must be performed out of doors, under the most carefully controlled safety conditions.

While the exact mechanism by which explosive bonds are formed with workpieces and explosive orders of magnitude smaller.

An explosive may be defined as a chemical substance which undergoes a rapid chemical reaction, during which large quantities of gaseous by-products and much heat are generated. There are many such chemical compounds and, for convenience, They are divided intotwo main groups: low explosives, such as gun powder; and high explosives. The latter category may be further subdivided into initiating (or primary) explosives and secondary explosives. Primary explosives are highly sensitive chemical compounds which may easily be detonated by the application of heat, light, pressure, etc. thereto. Examples of primary explosives are the azides and the fulminates. Secondary explosives, on the other hand, generate more energy than primary explosives, when detonated, but are quite stable and relatively insensitive to heat, light, or pressure. In the prior art, primary explosives are used exclusively to initiate detonation in the higher energy, secondary explosives.

Strictly speaking, the difference between a low explosive, such as gun powder, and a high explosive, such as TNT, is in the manner in which the chemical reaction occurs. The fundamental difference is between burning (or deflagration) and detonation, not between the explosive substances themselves. It is quite common to find that an explosive can either deflagrate or detonate according to the method of initiation or the quantity of explosive involved. If the mass of explosive matter is small, thermal ignition thereof, as by an open flame, usually, if not always, leads to deflagration; but if the massexceeds a certain critical value, it is possible for the burning to become so rapid that it sets up a shockwave front in the explosive material and detonation ensues. The critical mass varies from explosive to explosive, thus, for the primary explosive lead azide, the crit ical mass is too small to measure, whereas for TNT it is in the order of 2000 pounds. Thus, the application of an open flame to a mass of TNT of, say, 1800 pounds would not produce detonation but only deflagration. The application of the same open flame to 2200 pounds of TNT, however, would produce an immediate detonation. Quantities of secondary explosive, therefore, which are'smaller than the critical mass must be detonated by an intense shock, e.g., from the detonation of a primary explosive such as lead azide and are thus of no value for the bonding of miniature workpieces.

Prior to my invention, then, primary explosives were used exclusively for initiating detonation in secondary explosives such as TNT, dynamite and the like. Because the critical mass of such primary explosives is so small as to be unmeasurable, the empirical equations developed for the use of subcritical masses of secondary explosives are inapplicable. This is primarily due to the difference in the parameters, such as the detonation velocity, of the highly sensitive primary explosives, and the relatively insensitive secondary explosives. The detonation velocity of the primary explosive mercury fulminate, for example, is approximately 2000 meters per second, whereas the detonation velocities of the secondary explosives TNT and nitroglycerin are approximately 6000 meters per second and 8000 meters per second, respectively. Amore detailed discussion of the thermochemistry of explosives may be found in the publications entitled, Detonation in Condensed Explosives, by J. Taylor, published by Oxford University Press, London, 1952 and Explosive Working of Metals, by]. S. Rinehart and J. Pearson, published by Macmillan, New York, 1963.

SUMMARY OF THE INVENTION Briefly, my invention comprises, in a first preferred embodiment, a method of bonding a first workpiece to a second workpiece. The method comprises the steps of: placing said first and second workpieces in juxtaposition to each other; and detonating a primary explosive in the region of the desired bond, the force created by the detonation of said primary explosive accelerating at least one of said workpieces towards the other, to thereby form an explosive bond between said workpieces.

Detonation of the explosive material is accomplished, in one embodiment of the invention, by applying heat to the workpiece. In other embodiments of the invention, detonation is accomplished by the application of light, laser, or acoustic energy to the explosive material. In still further embodiments of the invention, detonation is accomplished by means of alpha particles, shock waves, mechanical pressure, an electron beam, alternating magnetic or electric fields, an electric discharge or the provision (or removal) of a chemical atmosphere. In some embodiments of the invention, the bonding force is applied directly to the microcircuits to be bonded; in other embodiments, the bonding force is applied through a protective bonding medium.

Another embodiment of my invention comprises a method of bonding the microleads of at least one beam leadlike device to corresponding regions of a workpiece. The method comprises the steps of placing a charge of explosive material proximate each of the microleads to be bonded in a position to accelerate the microleads towards the workpiece and detonating the explosive material to explosively bond the microleads to corresponding regions of the workpiece. As before, the explosive materialmay be detonated by heat, light, sound, pressure, etc. and may be applied directly to the workpiece or through a protective buffer medium, such as stainless steel or a polyimide, such as KAPTON.

croleads of a beam lead-like device;

FIG. 2 is a partial top view of a plurality of beam-lead devices, prior to separation, and shows in greater detail the manner in which the explosive material is deposited thereon;

FIG. 3 is an isometric view of a single beam-lead device and shows the location of the explosive material on the microleads thereof in greater detail;

FIG. 4 is a partial, cross-sectional view of a beamlead device prior to the explosive bonding thereof to the land areas of a substrate;

FIG. 5 is a partial, cross-sectional view of the beamlead device shown in FIG. 4 after it has been explosively bonded to the substrate;

FIG. 6 is a partial, cross-sectional view of the beamlead device shown in FIG. 4 illustrating the use of a buffer member positioned intermediate the explosive material and the beam-lead device;

FIG. 7 is a plan view of the buffer member shown in FIG. 6 depicting the location of the explosive charges thereon in greater detail;

'FIG. 8 is a partial, cross-sectional view of the beamlead device shown in FIG. 6 after explosive bonding to the substrate has occurred;

FIG. 9 is an isometric view of an apparatus for. explosively bonding a plurality of beam-lead devices to a substrate by the application of light thereto;

FIG. 10 is a partially illustrative, partially schematic diagram depicting the use of light from an optical maser to detonate the explosive material;

FIG. 11 is an isometric view of an apparatus for explosively bonding a plurality of beam-lead devices to a substrate by the use of focused light from an incandescent lamp; I

FIG. 12 is an isometric view of an apparatus which may be used to explosively bond a plurality of beamlead devices to the land areas of a substrate by the application of heat thereto;

FIG. 13 is a side view of an apparatus which may be used to bond a plurality of beam-lead devices to the land areas of a substrate by the use of radio frequency induction heating;

FIG. 14 is a side view of an apparatus which-may be used to bond a plurality of beam-lead devices to the land areas of a substrate by the use of radio frequency dielectric heating;

FIG. 15 is an isometric view of an apparatus which may be used to bond a plurality of beam-lead devices to the land areas of a substrate by the use of acoustical energy;

FIG. 16 is a side view of an apparatus which may be used to bond a plurality of beamlead devices to the land areas of a substrate by the use of simple mechanical pressure applied through a compliant medium;

FIG. 17- is a side view of an apparatus which may be used to bond a plurality of beam-lead devices to the land areas of a substrate by means of an electrical discharge passing through the explosive material on the beam leads;

FIG. 18 is an isometric view of an apparatus which may be used to bond a plurality of beam-lead devices to the land areas of a substrate by means of a beam of electrons;

FIG. 19A is a cross-sectional view of a beam-lead device illustrating the manner in which the upper surface of the beam leads may be rendered undulating to improve the quality of the bond; and

FIG. 19B is a similar cross-sectional view illustrating the manner in which the upper surface of the beam leads may be castellated to improve the quality of the bond;

FIG. 20 is a partial, cross-sectional view illustrating the manner in which the contact pads of a flip chip IC device may be explosively bonded to the land areas of a substrate;

FIG. 21 illustrates an alternative embodiment of the invention which may advantageously be used to deposit conductive metal paths on an insulating substrate;

FIG. 22 illustrates the finished appearance of the apparatus shown in FIG. 21;

FIG. 23 is a side view of another embodiment of the invention in which spacing elements are provided intermediate the workpieces to be bonded to ensure the creation of a strong bond;

FIG. 24 is a side view of the elements depicted in FIG. 23 after an explosive bond has been formed;

FIG. -25 is aside view. of a buffer medium having a patterned workpiece fabricated on one side thereof and a correspondingly patterned explosive charge on the other surface thereof;

FIG. 26 is an isometric view of the buffer medium shown in FIG. 28 positioned over a substrate to which the metallic pattern is to be bonded;

FIG. 27 is an isometric view of the apparatus shown in FIG. 26 after the explosive bond has been formed;

FIG. 28 illustrates yet another embodiment of the invention which may be used to manufacture thin or thick film capacitors by explosive bonding techniques;

FIG. 29 illustrates the embodiment shown in FIG. 28 after the electrode of a capacitor has been explosively bonded to a substrate; v

FIG. 30 is another view of the capacitor shown in FIG. 29 illustrating the manner in which a counterelectrode may be explosively bonded thereto; and

FIG. 31 is an isometric view of the capacitor shown in FIG. 30 after the counter-electrode has been explosively bonded thereto.

DETAILED DESCRIPTION OF THE INVENTION FIG. 1 depicts an apparatus which may be used to deposit a small quantity of explosive material on the microleads of a beam-leaded IC device, or the like. As shown, a conventional wax-coated semiconductor carrier plate 30, having a plurality of beam-leaded IC devices 31, temporarily secured thereto, is placed on the bottom surface 32 of a hollow, rectangular container 33. Carrier plate 30 is restrained from movement, and aligned, by means of a plurality of first registration pins 34 which mate with a corresponding plurality of notches 35 in carrier plate 30. A second plurality of registration pins 38 are provided at the four comers of container 33. A rectangular stencil plate 40, having a plurality of orthogonally oriented slot apertures 41 therein, is adapted to fit down inside container 33 so that registration pins 34 and 38 mate with a corresponding plurality of apertures 39 in the stencil plate.

When so mated, the slot apertures 41 align with the beam leads of the IC devices 31.

Referring now to FIG. 2, as is well known, each of the beam-leaded IC devices 31 is provided with a plurality In accordance with standard manufacturing techniques for these devices, prior to separation, the beam leads of each device are interdigitated with the beam leads of its immediate neighbors. Registration pins 34 and 38, FIG. 1, align stencil plate 40 so that the slot apertures 41 therein are positioned intermediate each pair of beamlead devices and cross the interdigitated beam leads 42,

I FIG. 2, in the region of overlap.

Returning to FIG. 1, a squeegee 43 having a rubber roller 47 is sldeably mounted in a frame (not shown) which in turn is attached to the walls of container 33. The rubber roller 47 is adapted to fit within container 33 and to engage the upper surface of stencil plate 40 when the plate is mated with registration pins 34 and 38 and positioned over lC carrier plate 30.

In operation, the carrier plate, bearing the IC devices whose beam leads are to be coated with explosive material, is placed on the bottom surface 32 of container 33 and aligned therewith by means of registration pins 34. Next, stencil plate 40 is fitted over the aligned carrier plate 30 and a metered quantity of explosive material deposited from a suitable container onto the stencil plate. Squeegee 43 is then lowered into engagement with the stencil plate and rolled back and forth to force the explosive material down into slotted apertures 41 and, hence, onto the beam leads of each IC device. When the metered quantity of explosive material has been consumed, the stencil plate and the carrier are removed from container 33 and the explosive material permitted to dry. The individual IC devices are then separated from the carrier by any of several conventional techniques.

It is, of course, necessary to select an explosive which is not so sensitive that the squeegee operation will cause premature detonation thereof. Typically, the explosive material is dissolved in some suitable chemical solution which facilitates the stenciling of the explosive onto the IC device. In addition, the solvent may inhibit premature detonation, at least until the solution has evaporated and the explosive material is dry.

It will be appreciated that a suitably patterned silkscreen (or other equivalent screening device) could be substituted for stencil plate 40. Other analogous printing techniques may, of course, also be used to apply the explosive to the workpiece. It will further be appreciated that this technique for depositing a patterned charge of explosive material onto a workpiece to be explosively bonded is not necessarily restricted to miniature workpieces, such as [C devices or to substrates. The technique may be used, for example, on much larger workpieces. Indeed, a patterned charge of a conventional, secondary explosive may also be deposited on a workpiece by this technique, provided that the secondary explosive is dissolved in some suitable vehidc to render it sufficiently mobile to pass through the apertures of a stencil or a screen. In this latter event, the stencil plate or silk-screen could be re-used to screen-on the necessary charge of primary explosive required to detonate the secondary explosive.

FIG. 3 illustrates the appearance of a beam-lead deviceafter it has been coated with explosive material and separated from its neighboring devices. As can be seen, a small quantity of explosive material 48 has been deposited on each beam lead 42. It will be apparent that the quantity of explosive deposited, and hence the bonding force produced when the explosive is detonated, may be controlled by varying the width of theapertures in the stencil plate and/or by altering the thickness of the stencil plate, thereby affecting the amount (i.e., width and height) of explosive material deposited on the beam leads.

For some special applications, it may be desirable to deposit unequal amounts of explosive material on each beam lead. The above-described apparatus can easily accommodate this requirement by a combination of the above-described changes to the apertures of the stencil plate. Further, the apparatus may easily be adapted to handle different IC circuit configurations, or different substrate arrangements, by merely substituting an appropriately configured stencil plate. The apparatus can also handle an individual IC device, if so desired, by the use of a suitably dimensioned holder for the individual device. Advantageously, apertures 41 in stencil 40 are arranged to deposit explosive material onto each beam lead no closer to the main part of the device than A; 'of the length of the beam lead and no further from the device than of the length of the beam lead. Advantageously, the average distance-used in practice is approximately Va of the length of a beam lead.

As previously-discussed, in the bonding of miniature workpieces, the conventional use of a secondary high explosive, which is detonated by means of a detonator,

is impossible. I have discovered, however, that primary explosives may be used to bond such miniature workpieces. Of the many known primary explosives, the azides and the fulminates are probably the most widely understood, although many other chemical compounds exhibit similar characteristics and may also be used for the explosive bonding of miniature workpieces. The choice of the particular primary explosive to be used in any given bonding application is a function of the amount of explosive force-required and/or the manner in which it is desired to initiate detonation. Advantageously, the detonation of the primary explosive, in accordance with my invention, may be accomplished by the application of heat, light, sound, pressure, shock waves and the introduction (or removal) of a suitable chemical atmosphere. For example, if light is employed as the detonating mechanism, then silver nitride (Ag N) or cuprous azide (Cu(N may be used as the primary'explosive. Alternatively, if detonation is accomplished by means of mechanical force and pressure, mercury fulminate (C N O I-l g) or lead azide (Pb(N maybe used as the primary explosive.

Table A, below, lists some of the more common azide compounds, together with their critical detonation temperatures.

TABLE A THE MORE COMMON AZIDE EXPLOSIVES Critical Compound Formula Detonation Temp. C Lead Azide Pb(N,) 350 Silver Azide Ag(N,), 300 Titanium Azide Ti N 350 Boron Azide B(N,) Silicon Azide Si(N Mercuric Azide I-Ig(N,) 460 Copper Azide Cu(N,), 215 Cadmium Azide CCKNa): I44 Ammonium Azide NH,(N I Mercurous Azide HgAN 210 2 Table B, below, lists some of the more common fulminate compounds, together with their critical detonation temperatures.

Table C, below, lists some additional primary explosive compounds, together with their critical detonation temperatures.

TABLE C MISCELLANEOUS PRIMARY EXPLOSIVES Critical Compound Formula Detonation Temp. C Mercuric Acetylidette HgC, 260 Mercurous Acetylide l-lg,C, 280 Copper Acetylide CuC 280 Silver Acetylide Ag,C 200 Lead Styphnate CJ-i,N,O,Pb 295 Barium Styphnate C,H,N,O,Ba 285 Silver Nitride Ag,N 155 Tetrazene 200 Diazodinitrophenol HOC.H,( NO,),N( :N) 180 (DDNP) The above three tables are by no means all inclusive. There are many other unstable chemical compounds which may be classified as primary explosives and which, under appropriate conditions of temperature and pressure, might conceivably be utilized for the explosive bonding of miniature workpieces. However, the explosives listed in the above tables are of primary interest in this regard.

Turning now to FIG. 4, there is shown a crosssectional view of integrated circuit device 31 prior to its being bonded to the terminal land areas 50 of a ceramic substrate 52. A thin film 51 of grease, dirt, metal oxide, or other contaminants is shown on the upper sur face of land areas 50. A similar film will generally also be present on the surface of beam leads 42 but, for the sake of clarity, this film has been omitted from thedrawing.

It will be noted that each beam lead is bent upward away from the substrate to form a small angle a with the plane of the substrate. In order for a bond to form between a beam lead and the corresponding land area of the substrate, the explosive charge 48, when detonated, must accelerate the beam lead downward towards the land area with a sufficiently high impact velocity that the resultant impact pressure is of sufficient magnitude to cause substantial plastic flow of the workpieces to be joined. Thus, the yield points of the materials from which the workpieces are fabricated must be considerably exceeded by the impact pressure.

An important aspect of explosive bonding is the phenomenon known as jetting," that is, the process of material flow which occurs when two metal workpieces strike each other at sufficiently high impact velocity to cause plastic flow of the workpiece metals and the formation of a re-entrant jet" of material between the workpieces, as shown by the arrows 49 in FIG. 4. The formation of this jet" of molten material is important to the establishment of a strong bond, as it removes any impurities and oxides which may be present on the surfaces of the workpieces to be bonded and brings freshly exposed, virgin metal surfaces into intimate contact in the high-pressure collision. Notwithstanding the above, some workpiece materials, for example, gold, may be satisfactorily bonded even without the presence of jetting. This is due to the inherently oxide-free surfaces of these materials. In that event, the angle which is formed between the beam lead and the substrate becomes less critical and in some instances even unimportant.

The impact pressure required to bond a beam lead to the corresponding substrate land area may be calculated from the shock Hugoniot data for the workpiece materials. Once the impact pressure required for bonding is known, the impact velocity may be calculated.

This in turn yields the necessary ratio of accelerating explosive charge to metal mass (C/M), hence, the quantity of explosive material required for a given bonding operation. a

v The desirable jetting phenomenon, however, only occurs if the angle of impact, B, at the collision point exceeds a certain critical value. Further, there can exist either a stable jetting condition or an unstable jetting condition, the latter being undesirable as it results in a bond of poor quality.

Stable jetting will occur if the collision point at which the two surfaces first meet, travels along the interface with a velocity equal to or greater than the highest signal velocity in either of the two workpiece materials. Table D, below, lists the velocity of sound in several typical metals and, for comparison, Table E, lists the detonation velocity of several typical primary explosives.

Detonation Velocity of Typical Primary Explosives Explosive Detonation Velocity /sec) Lead Azide 4000 Lead Styphnate 5000 Mercury Fulminate 5050 DDNP 6800 If the two workpieces to be bonded are positioned parallel to one another, the collision point velocity equals the detonation velocity of the accelerating explosive charge. It will thus be seen that for the types of metals commonly used for microleads and land areas in the electronics industry, by the choice of an appropriate explosive material, the collision point velocity will always exceed the bulk sonic velocity in the workpiece metals.

Actually, if the collision point velocity substantially exceeds the bulk sonic velocity in the workpiece materials, another undesirable effect is noted. That is, the generation of expansion waves in the workpieces which tend to separate the inner surfaces thereof and destroy or weaken the bond immediately after its formation. The ideal situation is when the collision point velocity slightly exceeds the bulk sonic velocity so that stable jetting occurs, yet undesirable expansion waves do not occur. For parallel geometry, this condition can be achieved by slowing down the detonation velocity of the explosive material, for example, by the addition of inert materials such as liquid paraffin or French Chalk thereto, or by reducing the density of the explosive. For example, the addition of 30 percent liquid paraffin to lead azidewill reducethe velocity-of detonation from 4000 m/sec to 500 m/sec, but the mixing process is difficult to control and the results are often unpredictable. For these reasons, other means must be employed to reduce the collision point velocity.

If the workpieces to be bonded arenot held parallel, but rather are aligned so that they make a small angle a to one another, the collision point velocity is no longer the same as the detonation velocity of the explosive material, but falls to some fraction thereof. Thus, by varying the geometry of the bonding configuration, the collision point velocity may be adjusted so that it is only slightly more than the bulk sonic velocity in the workpiece materials, which is the optimum condition.

As previously discussed, there is a critical angle of contact B for the collision below which jetting and satisfactory bonding usually will not occur. For parallel geometry, [3 can be increased by increasing the ratio of explosive charge to mass (C/M). However, if this is attempted in nonparallel geometry, such as shown in FIG. 4, it is found that the collision point velocity also increases. There .is thus an interaction between changing the impact angle B so that it exceeds the critical angle below which jetting does not occur, and lowering the collision point velocity to approximately the bulk sonic velocity in the workpiece materials. Nevertheless, despite this interaction, for workpieces of the type shown in FIG. 4, and primary explosives of the types listed in Tables A, B, and C, there exists a broad range of orientations, charge densities, and explosive compounds which will simultaneously satisfy all these criteria and produce strong, sound bonds. As an example of a specific bond, which I have produced, according to the methods of this invention, a gold wire measuring 0.002- inch by 0.0005 inch was bonded to a gold-plated ceramic substrate by means of from 25 to 40 p. grams of lead azide. Detonation was accomplished by an electrical discharge from a 3 volt D.C. source. The wire made an angle of less than 5 to the plane of the substrate. I further discovered that bonding was facilitated if the temperature of the substrate was raised to 175C prior to passing the electrical discharge through the substrate.

FIG. 5 depicts the beam-leaded device shown in FIG. 4 after it has been explosively bonded to the substrate. The beam leads 43 are now, of course, flattened and substantially parallel to the substrate. A small area of discoloration or pitting 53 will be noted on each beam lead in the region priorly occupied by explosive material 48. This discoloration and pitting, however, does not affect the mechanical strength or electrical characteristics of the beam leads to any detectable degree.

In the explosive bonding of massive workpieces, the explosive is laid down upon the upper surface of the upper workpiece as a sheet charge. In the methods of my invention, however, the explosive material is not laid down as a sheet charge, but rather as a point charge. Thus, the region 54 in which bonding actually occurs does not extend over the entire area of the beam lead. This is of no great import, however, as it approxi- As previously mentioned, because of the size of the workpieces and the extremely large quantities of explosive materials employed, conventional explosive bonding is usually performed out of doors. Thus, the unwanted by-products of the explosion are quickly discharged into the atmosphere. Further, in the prior art, the massive workpieces employed are not particularly sensitive to contamination by these by-products. This is not necessarily true, however, of the miniature workpieces contemplated by this invention, particularly integrated circuits and the like. Here, the by-products of the explosion, both gaseous and particulate, pose a very real threat of contamination to the silicon or germanium material from which the active devices in the integrated circuits arefabricated. This contamination may, under certain circumstances, alter the operating characteristics of the devices or, worse, render them'totally inoperative. The same is true, to a lesser extent, of thinfilm capacitors and resistors which may also be fabricated upon the same substrate. Fortunately, I have discovered that this contamination can, in part, be prevented by conducting the explosive bonding in a partial vacuum, for example, by the use of a conventional bellshaped vacuum jar. In addition, by removing the air which is normally present between the workpieces, the partial vacuum tends to increase the workpiece acceleration, thereby improving the quality of the bond. As an alternative to the use of a partial vacuum, the explosive bonding may be effected through an intermediate buffer, such as a layer of plastic, for example the polyimide sold under the registered trademark KAP- TON, of the E. I. DuPont de Nemorus Co. Metallic material, for example, stainless steel, or the like, may also be used for the buffer medium.

FIGS. 6 and 7 illustrate the use of such a buffer layer in an explosive bonding operation. As shown ,therein,

.a film of plastic (e.g., a KAPTON film 3 mils thick) or metallic material (e.g., 303 type stainless steel 2 mils thick) 60 having a plurality of apertures 61 therein is positioned over the top surface of beam-lead device 31. The explosive material 48, which priorly was deposited directly onto the beam leads 42, is now deposited on the upper surface of the film 60. Additionally, if film 60 is plastic and, in addition, transparent, alignment of the explosive charges, with respect to the beam leads of the integrated circuit devices, may be facilitated, for example, by use of the alignment technique disclosed in U.S. Pat. application, Ser. No. 820,179 of F. J. Jannett, filed on Apr. 29, 1969.

The explosive charges which are deposited onto the buffer film may be placed there by means of the apparatus illustrated in FIG. 1, or by the use of a patterned silk-screen or printed onto the film, intaglio fashion, by means of a suitable rubber or metallic roller having a raised surface thereon which corresponds to the desired locations of the explosive charges.

FIG. 8 depicts the beam-lead device shown in FIG. 6 after the explosive material 48 has been detonated. As was the case illustrated in FIG. 5, the beam leads 42 are now substantially parallel to substrate 52 and bonded to the land areas 50 of the substrate at locations 54. The buffer film 60 is forced down about device 31 by the explosion, but is not ruptured. As a result, unwanted by-products of the explosion are prevented from reaching the sensitive portions of the substrate, and damage thereto is completely avoided. Although in FIG. 6 buffer sheet 60 is depicted as being apertured so that it may be fitted over the beam-lead devices, it will be appreciated that sheet 60 could be contoured,

rather than apertured, and in that event would also serve to protect the IC device from contamination as well as the substrate. After the bonding operation has been satisfactorily performed, buffer film 60 may be peeled off the substrate. If the sheet is fabricated from plastic material, however, no deleterious effects will occur if it is permitted to remain in place.

As previously mentioned, the detonation of the primary explosive, in accordance with my invention, may advantageously be accomplished by exposure to light.

Table F, below, lists some of the primary explosive compounds exhibiting this property,,together with the minimum light intensity required to initiate detonation thereof.

TABLE F PHOTOSENSITIVE EXPLOSIVE COMPOUNDS Compound Formula Light Intensity in Joules Centimeter Silver Azide AgN 2.6 Silver Nitride Ag N 0.2 Silver Acetylide Ag,C 0.8 Silver Fulminate AgONC 2.] Lead Azide Pb(N 2.0

The mechanism which renders these and other similar primary compounds sensitive to detonation by light is not fully understood. One theory is that the light is absorbed in a thin surface layer of. the explosive material and within 50p. seconds is degraded into heat; the explosion is then believed to occur by a normal thermal mechanism. Another theory is that the explosion occurs as a result of a direct photochemical decomposition of the explosive matter. Regardless of the theory, however, these compounds may be detonated by the application of light thereto and are useful for the explosive bonding of miniature workpieces.

FIG. 9 illustrates an apparatus which may be used to explosively bond the beam leads of an IC device using light as the detonating mechanism. It will be appreciated that this apparatus may also be used to bond other types of workpieces, for example, to explosively bond conductive metal paths onto a ceramic or glass substrate or to explosively bond the elements of capacitors, resistors, etc. to a substrate. The same is also true for the other apparatus discussed below with reference to FIGS. 10-18. The illustrative example of bonding the leads of an IC device to corresponding land areas on a substrate is not intended to be limiting and isonly exemplary. The beam leads of the devices 62 to be bonded are coated with a quantity of light-sensitive primary explosive, for example, silver azide, and thedevices then aligned with respect to the land areas of the substrate 63 in a conventional manner. If desired, the devices may be temporarily tacked to the substrate by means of a drop of alcohol, or the like. Substrate 63 is then placed within a glass vacuum jar 64, which is exhausted by means of an exhaust pipe 65 and a pump 66. One or more photo flash lamps 67, for example, krypton-filled quartz flash lamps are positioned outside the vacuum jar so that the light which is generated by the tubes will fall upon'the photosensitive material on the beam leads. Clearly, vacuum jar 64 must be transparent to the light energy from lamp 67. The vacuum jar may thus be entirely fabricated from glass or quartz or have one or more glass or quartz windows set in the walls thereof. Photo flash lamps 67 are connected via a pair of conductors 68 to a switch 69, thence to a suitable source of energizing potential 70.

In operation, switch 69 is closed to complete a circuit from source 70 to photo flash lamps 67. In a wellknown manner, the lamps fire and generate an intense burst of light which passes through the walls or windows in vacuum jar 64, and strikes the silver azide on each beam lead, detonating it and explosively bonding each of the IC devices 62 to substrate 63.

Silver azide is primarily responsive to light in the ultraviolet range (A 3500 A units) and krypton-filled photo flash lamps of the type shown in FIG. 9 produce more than enough energy in this ultraviolet range to detonate photosensitive silver azide. The typical duration of the flash from photo flash lamps 67 is approximately 60us and explosion of the silver azide usually occurs within 20;.ts thereafter. From Table F the critical light intensity required to detonate silver azide is 2.6 joules/cm which corresponds to 8 X 10 calories/mm This critical light intensity is independent of the mass of explosive materialused, at least in the range of from 200 to 1500 micrograms. Unwanted by-products of the explosion are, as previously discussed, vented from vacuum jar 64 by pump 66. However, in applications where these by-products are not troublesome, the bonding process can, of course, be conducted in a normal atmosphere. The use of a transparent plastic film positioned over the IC devices for alignment purposes is, of course, possible, provided that the intensity of the photo flash is sufficient to compensate for any light energy lost in passing through the transparent film. Further, this method of detonation may also be used with an explosively coated transparent buffer member positioned over the IC device and the substrate.

If the intensity of light from photo flash lamps 67 is not sufficient, additional lamps may be provided or a simple lens system (not shown) may be placed in front of each lamp to focus the light energy therefrom and thereby increase the light intensity above that critical value needed to detonate the explosive.

I have also discovered that a laser beam may be used to detonate the light-sensitive explosive, rather than the photo flash lamp illustrated in FIG. 9. As shown in FIG. 10, light from a pulsed or Q-switched laser 71 is expanded by a pinhole beam expander 72 and collimated by a lens 73. The collimated beam of laser energy is then directed upon the IC devices 62 on substrate 63 detonating the silver azide, or other photosensitive primary explosive, deposited on the beam leads thereof. Again, the substrate and IC devices could be positioned within a transparent vacuum jar, if desired, and the laser energy applied through the walls of the jar to detonate the photosensitive explosive material.

Contrary to what might be expected, the amount of light energy required to initiate detonation of a photosensitive explosive varies inversely with the duration of the flash. Thus, a longer flash, as might be obtained, for example, from a magnesium-filled flash bulb, would have to be several times as intense to produce detonation of the same explosive material. Further, due to thermal lag, if the duration of the flash is too great, the explosive material will deflagrate rather than detonate, regardless of the intensity. Thus, the use of pulsed light sources is, generally speaking, preferable to the use of a continuous light source. 

2. The method according to claim 1 wherein said detonating step comprises: raising the temperature of said explosive material above the critical detonation temperature thereof.
 3. The method according to claim 1 wherein said explosive material is photosensitive and said detonating step comprises: applying a beam of light to said photosensitive material of a wavelength and an intensity sufficient to induce explosion thereof.
 4. The method according to claim 1 wherein said detonating step comprises: applying a beam of Alpha particles to said explosive material of an intensity sufficient to induce explosion thereof.
 5. The method according to claim 1 wherein said detonating step comprises: passing an electrical discharge through said explosive material of an intensity sufficient to induce explosion thereof.
 6. The method according to claim 1 wherein said detonating step comprises: directing an electron beam onto said explosive material of an intensity sufficient to induce explosion thereof.
 7. The method according to claim 1 wherein said detonating step comprises: applying a beam of collimated, coherent radiation from an optical maser to said explosive material, said radiation being of a wavelength and an intensity sufficient to induce explosion thereof.
 8. The method according to claim 1 wherein said detonating step comprises: applying a mechanical force to said explosive material of an intensity sufficient to induce explosion thereof.
 9. The method according to claim 1 wherein said detonating step comprises: applying a shock wave to said explosive material of an intensity sufficient to induce explosion thereof.
 10. The method according to claim 1 wherein said detonating step comprises: applying a beam of acoustical energy to said explosive material of a wavelength and an intensity sufficient to induce explosion thereof.
 11. The method according to claim 1 wherein said detonating step comprises: applying an alternating magnetic field to said explosive material of a frequency and an intensity sufficient to induce explosion thereof.
 12. The method according to claim 1 wherein said detonating step comprises: applying an alternating electric field to said explosive material of a frequency and an intensity sufficient to induce explosion thereof.
 13. The method according to claim 1 wherein said detonating step comprises: introducing a chemical atmosphere to react with said explosive material and initiate explosion thereof.
 14. The method according to claim 1 wherein an inhibitory chemical atmosphere is maintained about said beam lead-like device and said detonating step comprises: removing said inhibitory chemical atmosphere to initiate explosion of said explosive material.
 15. The method according to claim 1 wherein said explosive material is a primary explosive and said placing step comprises: applying to at least one surface of each of the micro-leads to be bonded a mass of primary explosive which exceeds the critical mass of said primary explosive.
 16. The method according to claim 1 comprising the further step of: maintaining a partial vacuum about said beam lead-like device and said workpiece, prior to the detonation of said explosive material.
 17. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, said microleads each having a quantity of primary explosive material deposited thereon sufficient to create an explosive bond between each of said microleads and its respective predetermined region but insufficient to deleteriously damage said beam lead-like device or said workpiece, comprising the steps of: orienting said beam lead-like device with respect to said workpiece, thereby to place said microleads adjacent their respective predetermined Regions on the workpiece; and detonating said explosive material to explosively bond said microleads to said respective predetermined regions on the workpiece.
 18. The method according to claim 17 wherein said detonating step comprises: raising the temperature of said explosive material above the critical detonation temperature thereof.
 19. The method according to claim 17 wherein said explosive material is photosensitive and said detonating step comprises: applying a beam of light to said photosensitive material of a wavelength and an intensity sufficient to induce explosion thereof.
 20. The method according to claim 17 wherein said detonating step comprises: applying a beam of Alpha particles to said explosive material of an intensity sufficient to induce explosion thereof.
 21. The method according to claim 17 wherein said detonating step comprises: passing an electrical discharge through said explosive material of an intensity sufficient to induce explos1on thereof.
 22. The method according to claim 17 wherein said detonating step comprises: directing an electron beam onto said explosive material of an intensity sufficient to induce explosion thereof.
 23. The method according to claim 17 wherein said detonating step comprises: applying a beam of collimated, coherent radiation from an optical maser to said explosive material, said radiation being of a wavelength and an intensity sufficient to induce explosion thereof.
 24. The method according to claim 17 wherein said detonating step comprises: applying a mechanical force to said explosive material of an intensity sufficient to induce explosion thereof.
 25. The method according to claim 17 wherein said detonating step comprises: applying a shock wave to said explosive material of an intensity sufficient to induce explosion thereof.
 26. The method according to claim 17 wherein said detonating step comprises: applying a beam of acoustical energy to said explosive material of a wavelength and an intensity sufficient to induce explosion thereof.
 27. The method according to claim 17 wherein said detonating step comprises: applying an alternating magnetic field to said explosive material of a frequency and an intensity sufficient to induce explosion thereof.
 28. The method according to claim 17 wherein said detonating step comprises: applying an alternating electric field to said explosive material of a frequency and an intensity sufficient to induce explosion thereof.
 29. The method according to claim 17 wherein said detonating step comprises: introducing a chemical atmosphere to react with said explosive material and initiate explosion thereof.
 30. The method according to claim 17 wherein an inhibitory chemical atmosphere is maintained about said beam lead-like device and said detonating step comprises: removing said inhibitory chemical atmosphere to initiate explosion of said explosive material.
 31. The method according to claim 17 comprising the further step of: maintaining a partial vacuum about said at least one beam lead-like device and said workpiece prior to detonation of said explosive material.
 32. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said at least one beam lead-like device with respect to said substrate; applying an apertured buffer member over said aligned beam lead-like device, said buffer member having a plurality of explosive charges deposited on the upper surface thereof corresponding in location to the microleads of said beam lead-like device; registering said buffer member with respect to said beam lead-like device so that said plurality of explosive charges are positioned over said microleads; and detonating said explosive charges to apply an explosive bonding force through the buffer member to said microleads to bond said microleads to the corresponding regions Of said workpiece.
 33. The method according to claim 32 wherein said buffer member is transparent and said registering step comprises: optically aligning said explosive charges with respect to said microleads through the transparent buffer member.
 34. The method according to claim 32 wherein said detonating step comprises: raising the temperature of said explosive material above the critical detonation temperature thereof.
 35. The method according to claim 32 wherein said explosive material is photosensitive and said detonating step comprises: applying a beam of light to said photosensitive material of a wavelength and an intensity sufficient to induce explosion thereof.
 36. The method according to claim 32 wherein said detonating step comprises: applying a beam of Alpha particles to said explosive material of an intensity sufficient to induce explosion thereof.
 37. The method according to claim 32 wherein said detonating step comprises: passing an electrical discharge through said explosive material of an intensity sufficient to induce explosion thereof.
 38. The method according to claim 32 wherein said detonating step comprises: directing an electron beam onto said explosive material of an intensity sufficient to induce explosion thereof.
 39. The method according to claim 32 wherein said detonating step comprises: applying a beam of collimated, coherent radiation from an optical maser to said explosive material, said radiation being of a wavelength and an intensity sufficient to induce explosion thereof.
 40. The method according to claim 32 wherein said detonating step comprises: applying a mechanical force to said explosive material of an intensity sufficient to induce explosion thereof.
 41. The method according to claim 32 wherein said detonating step comprises: applying a shock wave to said explosive material of an intensity sufficient to induce explosion thereof.
 42. The method according to claim 32 wherein said detonating step comprises: applying a beam of acoustical energy to said explosive material of a wavelength and an intensity sufficient to induce explosion thereof.
 43. The method according to claim 32 wherein said detonating step comprises: applying an alternating magnetic field to said explosive material of a frequency and an intensity sufficient to induce explosion thereof.
 44. The method according to claim 32 wherein said detonating step comprises: applying an alternating electric field to said explosive material of a frequency and an intensity sufficient to induce explosion thereof.
 45. The method according to claim 32 wherein said detonating step comprises: introducing a chemical atmosphere to react with said explosive material and initiate explosion thereof.
 46. The method according to claim 32 wherein an inhibitory chemical atmosphere is maintained about said beam lead-like device and said detonating step comprises: removing said inhibitory chemical atmosphere to initiate explosion of said explosive material.
 47. The method according to claim 32 comprising the further step of: maintaining a partial vacuum about said at least one beam lead-like device and said workpiece, prior to the detonation of said explosive charges.
 48. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, said microleads each having a quantity of photosensitive primary explosive material deposited thereon, comprising the steps of: orienting said beam lead-like device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, placing said workpiece with the oriented beam lead-like device thereon within a chamber having at least one transparent portion, creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion, and applying light energy from At least one light source to said microleads through said at least one transparent portion of the chamber to detonate said photosensitive primary explosive material and bond said microleads to said respective predetermined regions.
 49. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, said microleads each having a quantity of photosensitive primary explosive material deposited thereon, comprising the steps of: orienting said beam lead-like device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, positioning said workpiece with said oriented device thereon proximate the exit port of an optical maser, energizing said optical maser to produce a beam of light, and passing said beam of light through a beam expander so that it impinges upon said microleads and detonates said photosensitive primary explosive material to explosively bond said microleads to the respective predetermined regions of said workpiece.
 50. The method according to claim 49 comprising the further steps of, prior to said energizing step: placing said workpiece with said oriented device thereon within a chamber having at least one transparent portion, creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion, and then directing said expanded beam of light through said transparent portion of the chamber to impinge upon said microleads.
 51. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, each of said workpieces having a quantity of primary explosive material deposited thereon, comprising the steps of: orienting said beam lead-like device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, positioning said workpiece with said oriented device thereon proximate the focus of at least one focused radiant energy lamp, and energizing said lamp to apply focused radiant energy to said microleads to detonate said primary explosive material and explosively bond said microleads to the respective predetermined regions of said workpiece.
 52. The method according to claim 51 comprising the further steps of, prior to said energizing step: placing said workpiece with said oriented device thereon within a chamber having at least one transparent portion, creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion, and directing the focused radiant energy from said at least one lamp through said transparent portion of the chamber to impinge upon said microleads.
 53. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, each of said microleads having a quantity of primary explosive material deposited thereon, comprising the steps of: orienting said beam lead-like device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, placing said workpiece with the oriented device thereon upon a thermally conducting susceptor, and heating said susceptor to raise the temperature of said primary explosive material above the critical detonation temperature thereof to explosively bond said microleads to the respective predetermined regions of said workpiece.
 54. The method according to claim 53 comprising the further steps of, prior to said heating step: positioning said susceptor with the workpiece and oriented device thereon within a chamber, and creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion.
 55. A method of bonding microleads of a beam lead-like device to respective predetermined regionS of a frangible workpiece, each of said microleads having a quantity of primary explosive material deposited thereon, comprising the steps of: orienting said beam lead-like device with respect to said workpiece so that said microleads thereof are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, placing said workpiece with said oriented device thereon within the coils of a radio frequency induction heater, and passing a radio frequency current through said coils to raise the temperature of said explosive material above the critical detonation temperature thereof to explosively bond said microleads to the respective predetermined regions of said workpiece.
 56. The method according to claim 55 comprising the further step of, prior to said passing step: creating a partial vacuum about said workpiece and said oriented device to exhaust unwanted by-products of the explosion.
 57. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, each of said microleads having a quantity of primary explosive material deposited thereon, comprising the steps of: orienting said beam lead-like device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, placing said workpiece with said oriented device thereon between the plates of a radio frequency dielectric heater, and applying a radio frequency potential to the plates of said dielectric heater to raise the temperature of said explosive material above the critical detonation temperature thereof to explosively bond said microleads to the respective predetermined regions of said workpiece.
 58. The method according to claim 57 comprising the further step of, prior to said applying step: creating a partial vacuum about said workpiece and said oriented device to exhaust unwanted by-products of the explosion.
 59. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, each of said microleads having a quantity of primary explosive material deposited thereon, comprising the steps of: orienting said beam lead-like device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, positioning said workpiece and the oriented device thereon proximate the exit port of an ultrasonic horn, and applying ultrasonic energy to the input port of said horn to apply ultrasonic energy to said microleads to detonate said explosive material and explosively bond said microleads to the respective predetermined regions of said workpiece.
 60. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, each of said microleads having a quantity of primary explosive material deposited thereon, comprising the steps of: orienting said device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, positioning a compliant member over said workpiece and said oriented device, and applying mechanical force through said compliant member to said microleads to detonate said explosive material and explosively bond said microleads to the respective predetermined regions of said workpiece.
 61. The method according to claim 60 comprising the further step of, prior to said applying step: creating a partial vacuum about said workpiece and said oriented device to exhaust unwanted by-products of said explosion.
 62. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, each of said microleads having a quantity of primary explosive material deposited thereon, comprising the steps of: orientinG said device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, contacting at least one land area of said workpiece with a first electrical contact, contacting the explosive material on at least one microlead of said device with a second electrical contact, and applying an electrical potential to said first and second electrical contacts to create an electrical discharge through said explosive material to detonate said explosive material and explosively bond said at least one microlead to the respective predetermined region of said workpiece.
 63. The method according to claim 62 comprising the further step of, prior to said applying step: creating a partial vacuum about said workpiece and said oriented device to exhaust unwanted by-products of the explosion.
 64. A method of bonding microleads of a beam lead-like device to respective predetermined regions of a frangible workpiece, each of said microleads having a quantity of primary explosive material deposited thereon, comprising the steps of: orienting said device with respect to said workpiece so that said microleads are positioned over the respective predetermined regions of the workpiece to which they are to be bonded, placing said workpiece and said oriented device within the vacuum chamber of an electron beam machine, exhausting said vacuum chamber, energizing the gun of said electron beam machine to produce a beam of electrons, and deflecting said electron beam to impinge upon all of said microleads to detonate the explosive material thereon and explosively bond said microleads to the respective predetermined regions of said workpiece.
 65. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said microleads; placing said buffer medium, workpiece, and aligned device within a chamber having at least one transparent portion; creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion; and applying light energy from at least one light source to the upper surface of said buffer medium through said at least one transparent portion of the chamber to detonate said photosensitive explosive material and bond said microleads to said corresponding regions.
 66. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said microleads; positioning said workpiece with said aligned device and said buffer medium thereon proximate the exit port of an optical maser; energizing said optical maser to produce a beam of light; and passing said beam of light through a beam expander so that it impinges upon the upper surface of said buffer medium and detonates said photosensitive explosive charges to explosively bond said microleads to the correspoNding regions of said workpiece.
 67. The method according to claim 66, comprising the further steps of, prior to said energizing step: placing said workpiece with said aligned device and said buffer medium thereon within a chamber having at least one transparent portion, creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion, and then directing said expanded beam of light through said transparent portion of the chamber to impinge upon said buffer medium.
 68. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said microleads; positioning said workpiece with said aligned device and said buffer medium thereon proximate the focus of at least one focused radiant energy lamp; and energizing said lamp to apply focused radiant energy to said buffer medium to detonate said explosive charges and explosively bond said microleads to the corresponding regions of said workpiece.
 69. The method according to claim 68, comprising the further steps of, prior to said energizing step: placing said workpiece with said aligned device and said buffer medium thereon within a chamber having at least one transparent portion, creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion, and directing the focused radiant energy from said at least one lamp through said transparent portion of the chamber to impinge upon said buffer medium.
 70. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said microleads; placing said workpiece with the aligned device and said buffer medium thereon upon a thermally conducting susceptor; and heating said susceptor to raise the temperature of said explosive charges above the critical detonation temperature thereof to explosively bond said microleads to the corresponding regions of said workpiece.
 71. The method according to claim 70, comprising the further steps of, prior to said heating step: positioning said susceptor with the workpiece, aligned device, and buffer medium thereon within a chamber; and creating a partial vacuum within said chamber to exhaust unwanted by-products of the explosion.
 72. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said mIcroleads; placing said workpiece with said aligned device and said buffer medium thereon within the coils of a radio frequency induction heater; and passing a radio frequency current through said coils to raise the temperature of said explosive charges above the critical detonation temperature thereof to explosively bond said microleads to the corresponding regions of said workpiece.
 73. The method according to claim 72, comprising the further step of, prior to said passing step: creating a partial vacuum about said workpiece, said aligned device, and said buffer medium to exhaust unwanted by-products of the explosion.
 74. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said microleads; placing said workpiece with said aligned device and said buffer medium thereon between the plates of a radio frequency dielectric heater; and applying a radio frequency potential to the plates of said dielectric heater to raise the temperature of said explosive charges above the critical detonation temperature thereof to explosively bond said microleads to the corresponding regions of said workpiece.
 75. The method according to claim 74, comprising the further step of, prior to said applying step: creating a partial vacuum about said workpiece, said aligned device, and said buffer medium to exhaust unwanted by-products of the explosion.
 76. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said microleads; positioning said workpiece with said aligned device and buffer medium thereon proximate the exit port of an ultrasonic horn; and applying ultrasonic energy to the input port of said horn to apply ultrasonic energy to said buffer medium to detonate said explosive charges and explosively bond said microleads to the corresponding regions of said workpiece.
 77. A method of bonding the microleads of at least one beam lead-like device to corresponding regions of a workpiece, comprising the steps of: aligning said device with respect to said workpiece so that the microleads thereof are positioned over the corresponding regions of the workpiece to which they are to be bonded; placing a buffer medium over said aligned device and said workpiece, said buffer medium having a plurality of photosensitive explosive charges deposited on the upper surface thereof; aligning said buffer medium with respect to said at least one device so that said plurality of explosive charges substantially overlay said microleads; placing said workpiece, said aligned device, and said buffer medium within the vacuum chamber of an electron beam machine; exhausting said vacuum chamber; energizing the gun of said electron beam machine to produce a beam of electrons; and deflecting said electron beam to impinge upon said buffer medium to detonate said explosive Charges and explosively bond said microleads to the correspondng regions of said workpiece. 